Content of research

For microfabrication, we support the fabrication of devices on a micrometer to nanometer scale using a broad array of equipment for thin film formation, metal nanostructures, etc. Examples include pattern formation using a state-of-the-art electron beam lithography system installed in a clean room, film deposition using a multidimensional sputtering and atomic layer deposition system, etching using a reactive ion etching system, and device evaluation using FE-SEM.
For microstructure analysis, we offer support for material analysis through internal structure observation using aberration-corrected transmission electron microscopy (S/TEM) and compound beam microscopy (FIB-SEM). We also support surface and state analysis using a scanning electron microscope (FE-SEM), Auger electron spectrometer (AES) and electron probe microanalyzer (EPMA), and assist with measurements under special beams and environments using ultra-high voltage electron microscopy, time-resolved photoelectron microscopy and spin SEM.

Potential for social implementation

• ・Microfabrication: Metal thin film formation on various substrate surfaces, microfluidic channel fabrication, metal nanostructure fabrication, and imprint mold fabrication
• ・Microstructure analysis: Observation and elemental analysis of the shape of plated surfaces, compositional analysis of sintered materials, analysis of the inside of cells, etc.

Appealing points to industry and local governments

With the support of experienced researchers and engineers and in collaboration with coordinators and specialists nationwide, we have established a research and development support system that can provide the best solutions for users by utilizing research resources in Japan. Please contact us if you are interested in processing and analysis at any scale (micrometer, nanometer and so forth).