Hokkaido University Research Profiles

Japanese
Nanotechnology / Materials

Ultra-rapid Deposition of Photocatalytic Crystalline Titanium Dioxide Thin Films

Ultra-rapid electrochemical deposition technology that does not require high temperature heat treatment

Crystalline titanium dioxide is a practically important oxide as a photocatalyst. We have developed a technology to form crystalline titanium dioxide thin films, which generally require heat treatment at high temperatures, on various metal substrates within only a few seconds using an electrochemical deposition method in aqueous solution.

Content of research

We have succeeded in obtaining titanium dioxide thin film on a practical metal substrate such as Cu, Al, Zn and Fe by electrolysis from an aqueous solution containing TiF62- within only a few seconds. The obtained titanium dioxide thin film is anatase crystalline and shows photocatalytic activity without heat treatment. The obtained titanium dioxide thin film is anatase crystalline and shows photocatalytic activity without heat treatment. We have confirmed that it has excellent properties such as decomposition of organic contaminants on the surface by UV irradiation and superhydrophilicity. Since the titanium dioxide film is doped with substrate elements, the development of new functions such as visible light responsiveness can be expected. It can also be deposited on a transparent conductive substrate.

  • Cross-sectional TEM photograph of deposited titanium dioxide film and photograph showing superhydrophilicity by UV irradiation

Potential for social implementation

  • ・Photocatalyst
  • ・Self-cleaning surface
  • ・Antibacterial surface
  • ・Organic decomposition

Appealing points to industry and local governments

This is a simple electrochemical deposition process at ultra-high speed and near room temperature, which enables the deposition of crystalline titanium dioxide at a lower cost than conventional methods.

2022/5/27Released