Research

For microfabrication, we support the fabrication of devices on a micrometer to nanometer scale using a broad array of equipment for thin film formation, metal nanostructures, etc. Examples include pattern formation using a state-of-the-art electron beam lithography system installed in a clean room, film deposition using a multidimensional sputtering and atomic layer deposition system, etching using a reactive ion etching system, and device evaluation using FE-SEM.
For microstructure analysis, we offer support for material analysis through internal structure observation using aberration-corrected transmission electron microscopy (S/TEM) and compound beam microscopy (FIB-SEM). We also support surface and state analysis using a scanning electron microscope (FE-SEM), Auger electron spectrometer (AES) and electron probe microanalyzer (EPMA), and assist with measurements under special beams and environments using ultra-high voltage electron microscopy, time-resolved photoelectron microscopy and spin SEM.