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Ultra-rapid Deposition of Photocatalytic Crystalline Titanium Dioxide Thin Films
Ultra-rapid electrochemical deposition technology that does not require high temperature heat treatment
Crystalline titanium dioxide is a practically important oxide as a photocatalyst. We have developed a technology to form crystalline titanium dioxide thin films, which generally require heat treatment at high temperatures, on various metal substrates within only a few seconds using an electrochemical deposition method in aqueous solution.
Research
We have succeeded in obtaining titanium dioxide thin film on a practical metal substrate such as Cu, Al, Zn and Fe by electrolysis from an aqueous solution containing TiF62- within only a few seconds. The obtained titanium dioxide thin film is anatase crystalline and shows photocatalytic activity without heat treatment. The obtained titanium dioxide thin film is anatase crystalline and shows photocatalytic activity without heat treatment. We have confirmed that it has excellent properties such as decomposition of organic contaminants on the surface by UV irradiation and superhydrophilicity. Since the titanium dioxide film is doped with substrate elements, the development of new functions such as visible light responsiveness can be expected. It can also be deposited on a transparent conductive substrate.
Hiroki Habazaki Professor
